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QIII surface particle counter, surface cleanliness analyzer
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QIII surface particle counter, surface cleanliness analyzer
QIII surface particle counter, surface cleanliness analyzer
Product Description Surface Particle Density Verification Surface Particle Density Analyzer (Surface Cleaning Verification) and Product Information Surface Particle Density Analysis Counter American Pentagon QIII max (0.3um) and QIII Ultra (0.1micron) Object Surface Particle Counter Product Catalog, which is a necessary verification tool for surface particle detection and can gain recognition from your company's customers. For your reference. We are the general agent of American Pentagon in China. Current quotation: Pentagon QIII max (0.3um) USD ex-work Pentagon QIII Ultra (0.1micron) USD ex-work (converted to RMB including 17% VAT and related import expenses) Formal quotation based on detailed quotation sheet QIII Max /Ultra Update Features:



1. New sampling mode increases accuracy 2. 7" 800X480 large touch screen (QIII+ 6" touch screen) 3. Improved sampling Probe socket, easy to plug and replace 4. Two user-changeable battery sockets, hot-swappable (original standard configuration with 2 batteries, charger optional) 5. Can download data via USB 6. QIII Ultra can measure down to 0.1Micron for QIII Max &QIII Ultra Detailed particle size distribution: QIII Max QIII Ultra 0.3um 0.1um 0.5um 0.2um 1.0um 0.3um 3.0um 0.5um 5.0um 1.0um 10.0um 5.0um Suitable for use in: Suitable customer group: Packaging material manufacturers, such as packaging materials, clean paper, etc. Pharmaceutical equipment and machine surface cleaning verification: Bottle sorting area, filling machine, packaging machine, pharmaceutical packaging material manufacturers, such as packaging materials, etc. Sterile medical machinery initial packaging cleanliness T/CAMDI 009.1-2020 Particle contamination test method Gas stripping method Semiconductor yellow light, etching process, parts cleaning business, equipment cleaning and maintenance, optoelectronic factory, glass substrate factory, etc. Effective for exposure machines; development machines, etching, yellow light, and polarizer attachment machines Capture filter can collect particles and analyze particle composition by EDX or FTIR.
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